Immersion/Electroless Deposition of Cu on Ta
نویسندگان
چکیده
منابع مشابه
Low energy ion assisted deposition of Ta/Cu films
A combination of molecular dynamics simulations and experiments has been used to investigate the use of various low energy ion assisted vapor deposition approaches for controlling the interfacial structures of a model copper/tantalum multilayer system. Films were grown using argon ion beam assistance with either a fixed or modulated ion energy during metal deposition. The effect of sequential i...
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ژورنال
عنوان ژورنال: Electrochemical and Solid-State Letters
سال: 2004
ISSN: 1099-0062
DOI: 10.1149/1.1667794